讲座题目：The Way Forward in Numerical Investigation of the Atomic Layer Deposition Process
主讲人：Prof. Tien-Chien Jen 南非约翰内斯堡大学
The micro-semiconductor industry has ever since the inception, been confronted with the deposition of thinner films. These films are accompanied by some exceptional attributes to meet the requirement for the manufacture components with desired durability, efficiency and performance. The industry has, however, sort after atomic layer depositions (ALD) which has so far proven capable of depositing quality nano-films of superb features. These features are of utmost importance for advanced technology and to achieve optimized efficient products that require pin-hole-free, uniform, conformal and accurate thickness control. It is necessary to continually fathom and refined the knowledge of the fabrication process. The research endeavour within this field is studied by collaboration of Prof TC Jen and his team of researchers. The aim of understanding the thin film process of ALD is studied within the reactor to feature scale. The continuum, lattice Boltzmann, density function theory, molecular dynamics are utilized to numerical model the numerous phenomena inside the reactors and thin film features. This keynote reports on the current findings of the numerous research endeavours. This includes the behaviour and optimization of geometrical designs, ALD recipe refinements, velocity and exposure time phenomena, the chemical kinetics hypothesis, and the way forward in ALD numerical investigations.
Prof. Jen join University of Johannesburg on August 2015, before that Prof Jen was a faculty member at University of Wisconsin, Milwaukee. Prof Jen received his Ph.D. in Mechanical and Aerospace Engineering from UCLA, specializing in thermal aspects of grinding. He has received several competitive grants for his research, including those from the US National Science Foundation, the US Department of Energy and the EPA. Prof Jen is also the Director of Manufacturing Research Centre of the University of Johannesburg, and has received various awards for his research including the NSF GOALI Award. In 2011, Prof Jen was elected as a Fellow to the American Society of Mechanical Engineers (ASME), which recognized his contributions to the field of thermal science and manufacturing. Prof Jen has written a total of 250 peer-reviewed articles, including 103 peer-reviewed journal papers, published in many prestigious journals including International Journal of Heat and Mass Transfer, ASME Journal of Heat Transfer, ASME Journal of Mechanical Design and ASME Journal of Manufacturing Science and Engineering. He also has written 11 book chapters in special topics book.